- Производитель:
- Sigma-Aldrich
NACRES: | NA.23 |
Advantages
- Stable, ready to use
- Plates without generating ammonia fumes
- Produces quality electrical contacts on p- and n-type silicon
- Does not compensate for p- or n- type conductivity
- Excellent adhesion and solderability
- Plates on silicon, germanium, gallium arsenide, cadmium sulfide
The chemical reaction during the electroless plating process involves an oxidation-reduction reaction between nickelous and hypophosphite ions. The reaction is essentially a two step process occurring simultaneously.
(1) H2PO2- + H2O --> H2OPO3- + H2
(2) Ni ++ (complex) + H2 --> Ni + 2H+
The reaction progresses catalytically with nickel deposition occurring at the operating temperature of 95 °C - 100 °C. The nascent hydrogen evolved insures an oxide free nickel deposit. In addition some NiP formed in a side reaction improves corrosion resistance and solderability. The nickel deposit is highly conductive, remains unstressed, particularly after suitable heat treatment, and shows good adherence.
Electroless nickel plating solution (Nickelex) is a type of auto-catalytic plating in which many reactions occur in an aqueous solution without any external power source. Its process includes the catalytic reduction of nickel in an aqueous solution. Nickelex produces an amorphous deposition of nickel in the as-plated condition. It shows properties such as good hardness, corrosion resistance and wear resistance.
- Nickelex provides good mechanical and electrical contacts for semicodonductor devices (silicon rectifers, solar cells, varactors, microwave diodes, transistors, microcircuits, etc.). The quality of the electrical contact is excellent if the surface of silicon is abraded by lapping to increase surface recombination velocity; if the surface is highly doped from diffusion; or if the semicondcutor resistivity is low (0.1 ohm-cm). Nickelex also produces adherent deposits on germanium, gallium arsenide, and cadmium sulfide.
- The Nickelex plate exhibits excellent solderability with lead, tin, and Pb/Sn alloys. Flux can be omitted when furnaced soldered in a hydrogen or non-oxidizing atmosphere.
Instructions
Complete metallization procedures are provided for silicon rectifier and planar device fabrication. These procedures should be followed to obtain optimum adhesion of nickel and quality of the ohmic contacts.
Nickelex can be deposited on p-type porous silicon for potential usage in light-emitting diodes (LEDs), and organic solar cells.
form | liquid |
color | blue to green |
pH | 4.8-5.2 |
pictograms | GHS06,GHS08,GHS09 |
signalword | Danger |
hcodes | H301 + H311 - H315 - H317 - H319 - H332 - H334 - H341 - H350i - H360D - H372 - H410 |
pcodes | P202 - P273 - P280 - P301 + P310 - P302 + P352 + P312 - P305 + P351 + P338 |
Target Organs | Lungs |
RIDADR | UN3287 - class 6.1 - PG 3 - EHS - RQ-Toxic liquid, inorganic, n.o.s., HI: all |
WGK Germany | WGK 3 |
Flash Point F | Not applicable |
Flash Point C | Not applicable |
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